Semi-grade PP Depth Filter

High-end PP depth filter designed specifically for semiconductor chemical mechanical polishing (CMP) processes. Using a unique 3D gradient structure and nanofiber technology, it can accurately intercept large agglomerated particles (Agglomerates) that cause scratches, while allowing effective abrasive particles to pass through, maintaining the Slurry particle size distribution unchanged. Providing 70nm to 1.0µm accuracy, it is the best solution to optimize CMP yield and reduce costs.