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Semiconductor Process Filtration

Semiconductor Process Filtration

Semiconductor Process Filtration

Filtration solutions organised by fab process step — wet etch & clean, CMP slurry and ultrapure water — all built on the JIUNYUAN in-house part-number scheme.

Semiconductor Process Filtration is organised by the actual process step in the fab rather than by filter form factor. JIUNYUAN splits this line into three process segments: Wet Etch & Clean, CMP Slurry, and Ultrapure Water. The same membrane material carries different cleanliness requirements, temperature limits and acceptable extractable levels depending on the process step — organising by process is what makes first-time-right selection possible.

The wet etch and clean segment uses asymmetric PES and several PTFE constructions that must withstand SC-1, SC-2, SPM, BOE, DHF and TMAH, with temperature ratings from 38°C (HDPE hardware) to 180°C (all-PFA hardware) and retention from 1nm to 10μm. The CMP challenge is not "finer is better" — it is to intercept scratch-causing agglomerates while letting effective abrasive particles pass so the slurry particle size distribution (PSD) stays intact; depth, rolled, pleated and dual-layer constructions each have their place. The ultrapure water segment is driven by high flow, long service life, low metallic-ion release and fast conductivity recovery.

Every cartridge uses the JIUNYUAN in-house part-number scheme (JY-process-series-diameter-retention-length-options), so an orderable part number can be built from outer diameter, retention rating, length, end-cap type, O-ring material, cleanliness grade and packaging. All specifications should be confirmed by sample validation under your real process conditions.

10 items
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Dual-Layer Pleated / Rolled Filter for CMP

Dual-Layer Pleated / Rolled Filter for CMP

CMP Slurry
High-Capacity PP Depth Filter for CMP

High-Capacity PP Depth Filter for CMP

CMP Slurry
Nylon 66 Membrane Filter for CMP

Nylon 66 Membrane Filter for CMP

CMP Slurry
PES Membrane Filter for CMP

PES Membrane Filter for CMP

CMP Slurry
Pleated PP Filter for CMP

Pleated PP Filter for CMP

CMP Slurry
Semi-grade Surface-modified PTFE All-Fluoropolymer Filter

Semi-grade Surface-modified PTFE All-Fluoropolymer Filter

Wet Etch & Clean
Electronic-Grade Asymmetric PES Fine Filter

Electronic-Grade Asymmetric PES Fine Filter

Ultrapure Water
Electronic-Grade PP Filter

Electronic-Grade PP Filter

Ultrapure Water
High-Flow Large-Diameter Filter for UPW

High-Flow Large-Diameter Filter for UPW

Ultrapure Water
Rolled PP Long-Life Pre-RO Filter

Rolled PP Long-Life Pre-RO Filter

Ultrapure Water
Where to start

Process vs. Retention Rating

Retention requirements span a wide range even within one process step. Fix the process segment first, then work down to media and construction.

1nm10nm0.1µm1µm10µm100µmWet Etch & CleanJY-WE seriesCMP SlurryJY-CM seriesUPW point of useJY-UW11UPW pre-filtrationJY-UW31/32/33/34
CMP constructions

CMP Media Structures Compared

The four constructions capture particles by different mechanisms and suit different slurry conditions. Trial them in parallel and decide on measured scratch counts and change-out intervals.

Melt-blown depth

Continuous open-to-tight gradient; contaminant distributed through the full thickness for maximum dirt-holding

JY-CM31D / CM32D

Rolled

Continuously wound with ordered fiber arrangement and a tight pore distribution for the highest retention efficiency

JY-CM31R / CM32R

Pleated

Large area and low pressure drop, suited to high-solids and agglomeration-prone slurries

JY-CM33

Dual-layer pleated / rolled

Pleated outer layer carries capacity, rolled inner layer carries retention — both in one element

JY-CM61

Media selection

Process Chemical Compatibility Chart

Listed by actual semiconductor process chemistry against the six main media used in this category. Ratings are general guidance — actual concentration, temperature and exposure time will change the outcome.

Chemical / conditionAsymmetric
PES		Hydrophobic
PTFE		Modified
PTFE		PPNylon
66		UPE /
HDPE
DIW / UPW　ambient◎◎◎◎◎◎
SC1 (NH₄OH/H₂O₂)　≤80°C◎◎◎○△○
SC2 (HCl/H₂O₂)　≤80°C◎◎◎○△○
SPM (H₂SO₄/H₂O₂)　125–160°C✕◎△✕✕✕
H₂SO₄ 98%　20°C△◎○△✕△
HNO₃ 70%　20°C△◎△△✕△
H₃PO₄　≤60°C○◎◎○△○
HCl 37%　20°C◎◎◎○△○
DHF 10%　20°C◎◎◎○△○
BOE (NH₄F:HF)　20°C○◎◎○△○
TMAH 5%　20°C◎◎◎◎○◎
NH₄OH 30%　20°C◎◎◎◎○◎
H₂O₂ 30%　20°C◎◎◎○△○
IPA　20°C◎◎◎◎◎◎
PGMEA / PGME　20°C○◎◎○○◎
O₃ water 10 ppm　20°C△○△△✕△
CMP slurry (silica / alumina)　ambient◎○○◎◎◎
  • ◎ = Long-term compatible, use directly
  • ○ = Generally compatible, watch concentration and temperature limits
  • △ = Conditional, run a soak test first
  • ✕ = Clearly incompatible or loses mechanical strength

This chart is a starting point for selection, not an acceptance criterion. Before deployment, run soak tests plus flow and integrity re-checks at your actual concentration, temperature and run time.

Across categories

Other options for these processes

The products below serve the same three process segments but are filed under other categories by form factor. Open any of them for full specifications and the part-number builder.

Wet Etch & Clean
JY-WE11

Semi-grade PES Pleated Filter (HDPE core)

Asymmetric PES, HDPE/fluoropolymer hardware · 1nm–1µm · 70°C

JY-WE12

Semi-grade PES Pleated Filter (PP core)

Asymmetric PES, PP hardware · 5nm–1µm · 90°C

JY-WE21

Semi-grade All-PTFE Pleated Filter

Hydrophobic PTFE, all-PFA hardware · 10nm–10µm · 180°C

JY-WE21D

Semi-grade All-PTFE Disposable Capsule Filter

One-piece, in-line / T-flow · 10nm–1µm · 180°C

JY-WE23

Semi-grade PTFE Pleated Filter (HDPE core)

Three PTFE types, HDPE hardware · 20nm–1µm · 70°C

JY-WE24

Semi-grade PTFE Pleated Filter (PP core)

Three PTFE types, PP hardware · 20nm–1µm · 90°C

CMP Slurry
JY-CM31

Semi-grade PP Depth Filter

Melt-blown / rolled PP · 50nm–150µm · 80°C

JY-CM31K

Semi-grade PP CMP POU Filter

One-piece capsule, housing-free · 50nm–10µm

Ultrapure Water
JY-UW34

Facility-grade PP Melt-Blown Filter

Three-layer graded melt-blown PP · 0.1–70µm · 80°C

Frequently Asked Questions

Why organise semiconductor filters by process instead of by material?
The same material carries very different requirements at different process steps. A PTFE cartridge in wet etch must survive 180°C SPM; in CMP it runs at room temperature but must not alter the slurry particle size distribution. Hardware material, cleanliness grade and end-cap type all differ. Fix the process step first, then choose media and retention.
For CMP, is a finer retention rating always better?
No. CMP filtration aims to intercept scratch-causing agglomerates while letting effective abrasive particles pass. Too fine a rating removes effective particles, shifts the slurry PSD, degrades removal rate and uniformity, and collapses service life. Start at 3–10× the nominal slurry particle size, then tune against scratch counts and change-out frequency.
How do I choose between depth, rolled, pleated and dual-layer CMP filters?
High-solids or agglomeration-prone slurries favour pleated (large area, low ΔP). Highest retention efficiency favours rolled (graded fiber density). General duty favours melt-blown depth (lowest cost, high dirt-holding). When you need both high dirt-holding and high retention, use the dual-layer pleated-outer / rolled-inner construction. In practice, run all three in parallel and compare scratch counts and lifetime.
What is the difference between all-PFA and HDPE/PP hardware — is the premium worth it?
Temperature rating and metallic extractables. All-PFA reaches 180°C with the lowest metal release and is the only option for hot SPM, H₂SO₄ and H₃PO₄. HDPE hardware runs 38–70°C and PP around 90°C at materially lower cost. Below 70°C and without strongly oxidising acids, HDPE/PP hardware is sufficient — the fluoropolymer premium is not needed.
For UPW pre-filtration, rolled or melt-blown PP?
It depends on change-out economics. Rolled construction uses continuously wound microfiber for high dirt-holding and several times the life of standard melt-blown — best when feed turbidity swings or change-out labour is expensive. Melt-blown has lower initial cost and suits stable feed water. If you already run many housings, switching to Ø150mm high-flow cartridges can cut cartridge count by around 90%.
How do I read a JIUNYUAN part number?
The format is JY-series-diameter-retention-length-options. For example JY-WE21-83-R05-20-E3W means: wet-process PTFE family model 1, 83mm outer diameter, 5nm retention, 20-inch length, EPDM O-ring, cleanliness grade 3 (<3µg/device), UPW pre-wet packaging. Every product page carries a full part-number builder table.

Technical Articles in This Category

Understand the principles and how to read the specs before you choose.

2026-05-04

Multi-Stage Filtration Design Logic for Semiconductor UPW Systems

Semiconductor ultrapure water (UPW) quality targets far exceed pharmaceutical-grade water: ASTM D5127 Type E-1 mandates resistivit…

2026-05-04

UPW Filter Cartridge TOC & Particle Control: Reading Critical Specifications

TOC in ultrapure water (UPW) originates from three primary pathways: RO membrane leachates, ion-exchange resin bleed, and atmosphe…

2026-03-31

How Wrong Filter Selection Hurts Wafer Yield

A 12-inch wafer is worth ~USD 1,200 — one bad filter can scrap an entire batch. This article maps the 5 yield-loss paths, real incidents, ROI math (USD 8K vs USD 2M), and qualification SOPs.

Customization

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