Semi-grade Nylon66 Pleated Filter

High-efficiency filter specially designed for SEMI-Photo lithography process. Constructed of naturally hydrophilic Nylon 66 membrane, providing nanometer-level precision from 2nm to 0.1µm. It has excellent organic cleanliness and low metal precipitation, and can effectively intercept fine particles in photoresist glue and solvents, ensuring the yield and stability of the yellow photolithography process.