Semi-grade UPE Pleated Filter

Flagship UPE filter element specially designed for semiconductor yellow light lithography process (SEMI-Photo). Constructed with hydrophobic ultra-high molecular weight polyethylene (UPE) filter membrane, providing a wide range of precision from 2nm to 0.2µm. It has extremely low metal and organic precipitates and can effectively intercept soft colloids (Gels) and particles in photoresist liquid to ensure the yield of advanced processes.